In recent years, the Silicon Super-Junction (SJ) power metal-oxide semiconductor field-effect transistor (MOSFET), has garnered significant interest from spacecraft designers. This is due to their high breakdown voltage and low specific on-state resistance characteristics. Most of the previous research work on power MOSFETS for space applications concentrated on improving the radiation tolerance of low to medium voltage (~ 300V) power MOSFETs. Therefore, understanding and improving the reliability of high voltage SJMOS for the harsh space radiation environment is an important endeavor.In this work, a 600V commercially available silicon planar gate SJMOS is used to study the SJ technology’s tolerance against total ionizing dose (TID) and destructive single event effects (SEE), such as, single event burnout (SEB) and single event gate rupture (SEGR). A technology computer aided design (TCAD) software tool is used to design the SJMOS and simulate its electrical characteristics.
Electrical characterization of SJMOS devices showed substantial decrease in threshold voltage and increase in leakage current due to TID. Therefore, as a solution to improve the TID tolerance, metal-nitride-oxide-semiconductor (MNOS) capacitors with different oxide
itride thickness combinations were fabricated and irradiated using a Co-60 gamma-source. Electrical characterization showed all samples with oxide
itride stack gate insulators exhibited significantly higher tolerance to irradiation when compared to metal-oxide-semiconductor capacitors.
Heavy ion testing of the SJMOS showed the device failed due to SEB and SEGR at 10% of maximum rated bias values. In this work, a 600V SJMOS structure is designed that is tolerant to both SEB and SEGR. In a SJMOS with planar gate, reducing the neck width improves the tolerance to SEGR but significantly changes the device electrical characteristics. The trench gate SJ device design is shown to overcome this problem. A buffer layer and larger P+-plug are added to the trench gate SJ power transistor to improve SEB tolerance. Using TCAD simulations, the proposed trench gate structure and the tested planar gate SJMOS are compared. The simulation results showed that the SEB and SEGR hardness in the proposed structure has improved by a factor of 10 and passes at the device’s maximum rated bias value with improved electrical performance.

The scaling of transistors has numerous advantages such as increased memory density, less power consumption and better performance; but on the other hand, they also give rise to many reliability issues. One of the major reliability issue is the hot carrier injection and the effect it has on device degradation over time which causes serious circuit malfunctions.

Hot carrier injection has been studied from early 1980's and a lot of research has been done on the various hot carrier injection mechanisms and how the devices get damaged due to this effect. However, most of the existing hot carrier degradation models do not consider the physics involved in the degradation process and they just calculate the change in threshold voltage for different stress voltages and time. Based on this, an analytical expression is formulated that predicts the device lifetime.

This thesis starts by discussing various hot carrier injection mechanisms and the effects it has on the device. Studies have shown charges getting trapped in gate oxide and interface trap generation are two mechanisms for device degradation. How various device parameters get affected due to these traps is discussed here. The physics based models such as lucky hot electron model and substrate current model are presented and gives an idea how the gate current and substrate current can be related to hot carrier injection and density of traps created.

Devices are stressed under various voltages and from the experimental data obtained, the density of trapped charges and interface traps are calculated using mid-gap technique. In this thesis, a simple analytical model based on substrate current is used to calculate the density of trapped charges in oxide and interface traps generated and it is a function of stress voltage and stress time. The model is verified against the data and the TCAD simulations. Finally, the analytical model is incorporated in a Verilog-A model and based on the surface potential method, the threshold voltage shift due to hot carrier stress is calculated.