Description
Solar energy has become one of the most popular renewable energy in human’s life because of its abundance and environment friendliness. To achieve high solar energy conversion efficiency, it usually requires surfaces to absorb selectivity within one spectral range of interest and reflect strongly over the rest of the spectrum. An economic method is always desired to fabricate spectrally selective surfaces with improved energy conversion efficiency. Colloidal lithography is a recently emerged way of nanofabrication, which has advantages of low-cost and easy operation.
In this thesis, aluminum metasurface structures are proposed based on colloidal lithography method. High Frequency Structure Simulator is used to numerically study optical properties and design the aluminum metasurfaces with selective absorption. Simulation results show that proposed aluminum metasurface structure on aluminum oxide thin film and aluminum substrate has a major reflectance dip, whose wavelength is tunable within the near-infrared and visible spectrum with metasurface size. As the metasurface is opaque due to aluminum film, it indicates strong wavelength-selective optical absorption, which is due to the magnetic resonance between the top metasurface and bottom Al film within the aluminum oxide layer.
The proposed sample is fabricated based on colloidal lithography method. Monolayer polystyrene particles of 500 nm are successfully prepared and transferred onto silicon substrate. Scanning electron microscope is used to check the surface topography. Aluminum thin film with 20-nm or 50-nm thickness is then deposited on the sample. After monolayer particles are removed, optical properties of samples are measured by micro-scale optical reflectance and transmittance microscope. Measured and simulated reflectance of these samples do not have frequency selective properties and is not sensitive to defects. The next step is to fabricate the Al metasurface on Al_2 O_3 and Al films to experimentally demonstrate the selective absorption predicted from the numerical simulation.
In this thesis, aluminum metasurface structures are proposed based on colloidal lithography method. High Frequency Structure Simulator is used to numerically study optical properties and design the aluminum metasurfaces with selective absorption. Simulation results show that proposed aluminum metasurface structure on aluminum oxide thin film and aluminum substrate has a major reflectance dip, whose wavelength is tunable within the near-infrared and visible spectrum with metasurface size. As the metasurface is opaque due to aluminum film, it indicates strong wavelength-selective optical absorption, which is due to the magnetic resonance between the top metasurface and bottom Al film within the aluminum oxide layer.
The proposed sample is fabricated based on colloidal lithography method. Monolayer polystyrene particles of 500 nm are successfully prepared and transferred onto silicon substrate. Scanning electron microscope is used to check the surface topography. Aluminum thin film with 20-nm or 50-nm thickness is then deposited on the sample. After monolayer particles are removed, optical properties of samples are measured by micro-scale optical reflectance and transmittance microscope. Measured and simulated reflectance of these samples do not have frequency selective properties and is not sensitive to defects. The next step is to fabricate the Al metasurface on Al_2 O_3 and Al films to experimentally demonstrate the selective absorption predicted from the numerical simulation.
Details
Title
- Optical Simulation and Colloidal Lithography Fabrication of Aluminum Metasurfaces
Contributors
- Guan, Chuyun (Author)
- Wang, Liping (Thesis advisor)
- Azeredo, Bruno (Committee member)
- Wang, Robert (Committee member)
- Arizona State University (Publisher)
Date Created
The date the item was original created (prior to any relationship with the ASU Digital Repositories.)
2019
Subjects
Resource Type
Collections this item is in
Note
- Masters Thesis Mechanical Engineering 2019