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Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and…

Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

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    Title
    • Fabrication of Highly Spin-Polarized Co2FeAl0.5Si0.5 Thin-Films
    Contributors
    Date Created
    2014-04-15
    Resource Type
  • Text
    • Collections this item is in
    ASU Scholarship Showcase
    Identifier
    • Digital object identifier: 10.1063/1.4869798
    • International standard serial number
      2166-532X
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    • The final version of this article, as published in APL Materials, can be viewed online at: http://aip.scitation.org/doi/10.1063/1.4869798

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    This is a suggested citation. Consult the appropriate style guide for specific citation guidelines.

    Vahidi, M., Gifford, J. A., Zhang, S. K., Krishnamurthy, S., Yu, Z. G., Yu, L., . . . Newman, N. (2014). Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films. APL Materials, 2(4), 046108. doi:10.1063/1.4869798

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