Full metadata

Title
High Quality Transparent TiO2/Ag/TiO2 Composite Electrode Films Deposited on Flexible Substrate at Room Temperature by Sputtering
Description

Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10-3 Ω-1/sq.

Date Created
2013-06-07
Contributors
Resource Type
Text
Extent
8 pages
Language
eng
Copyright Statement
In Copyright
Reuse Permissions
Attribution
Primary Member of
ASU Scholarship Showcase
Identifier
Digital object identifier: 10.1063/1.4808438
International standard serial number
2166-532X
Peer-reviewed
No
Open Access
No
Series
APL MATERIALS
Handle
https://hdl.handle.net/2286/R.I.44829
Preferred Citation

Dhar, A., & Alford, T. L. (2013). High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering. APL Materials, 1(1), 012102. doi:10.1063/1.4808438

Level of coding
minimal
Cataloging Standards
asu1
Note
The final version of this article, as published in APL Materials, can be viewed online at: http://aip.scitation.org/doi/10.1063/1.4808438
System Created
  • 2017-07-13 03:24:15
System Modified
  • 2021-11-05 03:47:43
    •     
  • 3 years ago
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