Description

The strong light-matter interaction and the valley selective optical selection rules make monolayer (ML) MoS2 an exciting 2D material for fundamental physics and optoelectronics applications. But, so far, optical transition linewidths even at low temperature are typically as large as

The strong light-matter interaction and the valley selective optical selection rules make monolayer (ML) MoS2 an exciting 2D material for fundamental physics and optoelectronics applications. But, so far, optical transition linewidths even at low temperature are typically as large as a few tens of meV and contain homogeneous and inhomogeneous contributions. This prevented in-depth studies, in contrast to the better-characterized ML materials MoSe2 and WSe2. In this work, we show that encapsulation of ML MoS2 in hexagonal boron nitride can efficiently suppress the inhomogeneous contribution to the exciton linewidth, as we measure in photoluminescence and reflectivity a FWHM down to 2 meV at T = 4 K. Narrow optical transition linewidths are also observed in encapsulated WS2, WSe2, and MoSe2 MLs. This indicates that surface protection and substrate flatness are key ingredients for obtaining stable, high-quality samples. Among the new possibilities offered by the well-defined optical transitions, we measure the homogeneous broadening induced by the interaction with phonons in temperature-dependent experiments. We uncover new information on spin and valley physics and present the rotation of valley coherence in applied magnetic fields perpendicular to the ML.

Reuse Permissions
  • Downloads
    PDF (4.7 MB)

    Details

    Title
    • Excitonic Linewidth Approaching the Homogeneous Limit in MoS2-Based Van Der Waals Heterostructures
    Contributors
    Date Created
    2017-05-18
    Resource Type
  • Text
  • Collections this item is in
    Identifier
    • Digital object identifier: 10.1103/PhysRevX.7.021026
    • Identifier Type
      International standard serial number
      Identifier Value
      2160-3308
    Note
    • Published by the American Physical Society. View the article as published at https://journals.aps.org/prx/abstract/10.1103/PhysRevX.7.021026

    Citation and reuse

    Cite this item

    This is a suggested citation. Consult the appropriate style guide for specific citation guidelines.

    Cadiz, F., Courtade, E., Robert, C., Wang, G., Shen, Y., Cai, H., . . . Urbaszek, B. (2017). Excitonic Linewidth Approaching the Homogeneous Limit in MoS2-Based van der Waals Heterostructures. Physical Review X, 7(2). doi:10.1103/physrevx.7.021026

    Machine-readable links